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Advanced Equipment

Zhejiang Jingsheng Mechanical & Electrical Co., Ltd. (JSG) leads the iteration and breakthrough of products, processes, and equipment with innovation, focuses on international advanced and bottleneck technology, and promotes the industrialization of domestic semiconductor equipment and the upgrading of industrial chain. It drives stable and sustainable development with core technology and serve customers and investors with value.
Power Semiconductors and Advanced Process Equipment Semiconductor Materials and Equipment Photovoltaic Equipment

8-inch「Monolithic Silicon Epitaxial Furnace』

The 8-inch monolithic silicon epitaxial furnace developed by JSG is compatible with the growth of 6-inch and 8-inch silicon wafers, featuring reliable and stable structure and good film thickness and resistance uniformity

6inch「Silicon Carbide Epitaxial Furnace』

The 6-inch silicon carbide epitaxial furnace developed by JSG enables automatic control of the growth process and is compatible with the growth of 4-inch and 6-inch epitaxial wafers, featuring good film uniformity, simple structure and low single-chip cost

6inch「Vertical Silicon Carbide Epitaxial Furnace』

The 6-inch vertical silicon carbide epitaxial furnace developed by JSG enables the epitaxial growth of 4-inch and 6-inch wafers, featuring superior film quality and good process stability, with production efficiency effectively improved

6inch「Double-chip Silicon Carbide Epitaxial Furnace』

Compared with single-chip equipment, the 6-inch double-chip silicon carbide epitaxial furnace developed by JSG increases the single-set production capacity by 70% and reduces the single-chip operating cost by more than 30%

8inch「Furnace Tube』

The 8-inch furnace tube developed by JSG can process 150 pieces of products at the same time, thereby meeting the requirements of polysilicon, annealing and other processes. It has a high degree of automation and can be connected to the factory MES system

12inch「Furnace Tube』

The 12-inch furnace tube developed by JSG can process 125 pieces of products at the same time, thereby meeting the requirements of polysilicon, annealing and other processes. It has a high degree of automation and can be connected to the factory MES system

Advanced Process and Power Semiconductor Equipment（Some products）

With CVD technology as the core, it is applied to epitaxial equipment of advanced processes and power semiconductors
8-inch「Monolithic Silicon Epitaxial Furnace』
6inch「Silicon Carbide Epitaxial Furnace』
6inch「Vertical Silicon Carbide Epitaxial Furnace』
6inch「Double-chip Silicon Carbide Epitaxial Furnace』
8inch「Furnace Tube』
12inch「Furnace Tube』
Advanced Process and Power Semiconductor Equipment（Some products）

8-inch「Monolithic Silicon Epitaxial Furnace』

The 8-inch monolithic silicon epitaxial furnace developed by JSG is compatible with the growth of 6-inch and 8-inch silicon wafers, featuring reliable and stable structure and good film thickness and resistance uniformity

6inch「Silicon Carbide Epitaxial Furnace』

The 6-inch silicon carbide epitaxial furnace developed by JSG enables automatic control of the growth process and is compatible with the growth of 4-inch and 6-inch epitaxial wafers, featuring good film uniformity, simple structure and low single-chip cost

6inch「Vertical Silicon Carbide Epitaxial Furnace』

The 6-inch vertical silicon carbide epitaxial furnace developed by JSG enables the epitaxial growth of 4-inch and 6-inch wafers, featuring superior film quality and good process stability, with production efficiency effectively improved

6inch「Double-chip Silicon Carbide Epitaxial Furnace』

Compared with single-chip equipment, the 6-inch double-chip silicon carbide epitaxial furnace developed by JSG increases the single-set production capacity by 70% and reduces the single-chip operating cost by more than 30%

8inch「Furnace Tube』

The 8-inch furnace tube developed by JSG can process 150 pieces of products at the same time, thereby meeting the requirements of polysilicon, annealing and other processes. It has a high degree of automation and can be connected to the factory MES system

12inch「Furnace Tube』

The 12-inch furnace tube developed by JSG can process 125 pieces of products at the same time, thereby meeting the requirements of polysilicon, annealing and other processes. It has a high degree of automation and can be connected to the factory MES system

Advanced Process and Power Semiconductor Equipment（Some products）

With CVD technology as the core, it is applied to epitaxial equipment of advanced processes and power semiconductors
8-inch「Monolithic Silicon Epitaxial Furnace』
6inch「Silicon Carbide Epitaxial Furnace』
6inch「Vertical Silicon Carbide Epitaxial Furnace』
6inch「Double-chip Silicon Carbide Epitaxial Furnace』
8inch「Furnace Tube』
12inch「Furnace Tube』
Advanced Process and Power Semiconductor Equipment（Some products）

8-inch「Monolithic Silicon Epitaxial Furnace』

The 8-inch monolithic silicon epitaxial furnace developed by JSG is compatible with the growth of 6-inch and 8-inch silicon wafers, featuring reliable and stable structure and good film thickness and resistance uniformity

6inch「Silicon Carbide Epitaxial Furnace』

The 6-inch silicon carbide epitaxial furnace developed by JSG enables automatic control of the growth process and is compatible with the growth of 4-inch and 6-inch epitaxial wafers, featuring good film uniformity, simple structure and low single-chip cost

6inch「Vertical Silicon Carbide Epitaxial Furnace』

The 6-inch vertical silicon carbide epitaxial furnace developed by JSG enables the epitaxial growth of 4-inch and 6-inch wafers, featuring superior film quality and good process stability, with production efficiency effectively improved

6inch「Double-chip Silicon Carbide Epitaxial Furnace』

Compared with single-chip equipment, the 6-inch double-chip silicon carbide epitaxial furnace developed by JSG increases the single-set production capacity by 70% and reduces the single-chip operating cost by more than 30%

8inch「Furnace Tube』

The 8-inch furnace tube developed by JSG can process 150 pieces of products at the same time, thereby meeting the requirements of polysilicon, annealing and other processes. It has a high degree of automation and can be connected to the factory MES system

12inch「Furnace Tube』

The 12-inch furnace tube developed by JSG can process 125 pieces of products at the same time, thereby meeting the requirements of polysilicon, annealing and other processes. It has a high degree of automation and can be connected to the factory MES system

Advanced Process and Power Semiconductor Equipment（Some products）

With CVD technology as the core, it is applied to epitaxial equipment of advanced processes and power semiconductors
8-inch「Monolithic Silicon Epitaxial Furnace』
6inch「Silicon Carbide Epitaxial Furnace』
6inch「Vertical Silicon Carbide Epitaxial Furnace』
6inch「Double-chip Silicon Carbide Epitaxial Furnace』
8inch「Furnace Tube』
12inch「Furnace Tube』
Advanced Process and Power Semiconductor Equipment（Some products）